Seagate Interview Questions, Process, and Tips

Basic questions on c programming and dsa

Q1. Cquestions and dsa
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Q2. Ask about my project
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Q3. Ask about SDLC life cycle and agile methodologies.
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Q1. What is polymorphism
Ans. 
Polymorphism is the ability of a function or method to behave differently based on the object it is acting upon.
• Polymorphism allows objects of different classes to be treated as objects of a common superclass.

• It enables a single interface to be used for different data types or classes.

• Examples include method overloading and method overriding in object-oriented programming.
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Q2. Find missing number from nth number array.
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Find missing number from nth number array.
• Iterate through the array and calculate the sum of all numbers

• Calculate the sum of numbers from 1 to n using the formula n*(n+1)/2

• Subtract the sum of array from the sum of numbers from 1 to n to find the missing number
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Q3. Explain inheritance and it types
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Inheritance is a concept in object-oriented programming where a class inherits properties and behaviors from another class.
• Inheritance allows a class to reuse code from another class.

• Types of inheritance include single inheritance, where a class inherits from only one parent class, and multiple inheritance, where a class inherits from multiple parent classes.

• Example: Class B inherits from Class A, so Class B can access
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Q4. Find 2nd max elements from aaray
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Find 2nd max element from array of strings
• Sort the array in descending order

• Skip the first element (max element)

• Return the second element
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Strivers list Leetcode easy and medium questions

Q1. Storage related systems question
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Q2. Cloud related system design question
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Q1. Why would you like to join Seagate
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Q1. Career snapshot related questions
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Q1. Tell me about the photolithography process
Ans. 
Photolithography is a process used in microfabrication to transfer patterns onto a substrate using light-sensitive materials.
• Photolithography involves coating a substrate with a photoresist material

• A mask containing the desired pattern is placed over the photoresist-coated substrate

• The substrate is exposed to light, which passes through the mask and selectively exposes the photoresist

• After exposure, the photoresist is ...read more
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Q2. Tell me an experience when you made a mistake
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I once made a mistake in a lithography process by using the wrong exposure settings.
• Accidentally set the exposure time too long, resulting in overexposed patterns

• Realized the mistake during post-exposure inspection

• Learned to double-check settings before starting a process
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